IMXR Semiconductor Job Training VR Content (Semiconductor Job Training MR Content)

Semiconductor Job Training MR Content

IMXR® Semiconductor Job Training MR Content



There is a need to improve the next-generation semiconductor customized education environment in line with changes in industrial paradigm and market fluctuations.

IMXR Job Training Semiconductor Process Content provides repetitive and systematic job training for semiconductor equipment processes without time and place constraints in virtual space. By implementing a virtual reality-like environment, it is designed to allow users to experience vivid visual and auditory experiences as they interact in real processes.



Key Features

  · Real-Time Environment Recognition and Advanced Rendering  

This provides an immersive and highly interactive experience by seamlessly blending reality and virtual reality through high-quality rendering of the surrounding environment in real-time via the passthrough camera.

 


  · Interaction with 3D Objects  

Experience a realistic and intuitive interaction with virtual objects in a real-world environment. By manipulating virtual equipment placed within the physical space, users can enjoy an innovative experience where the boundaries between the physical world and digital content disappear.


  · Customized Lighting Environment for Real-World Integration  

A lighting environment identical to the real-world setting has been implemented and applied to the modeling. For example, in the lithography process, which is conducted in a yellow room, the yellow lighting has been accurately applied to the modeling, providing an authentic representation.

Real Environment
VR EnvironmentMR Environment


  · High-Quality 3D Graphics and Animation  

Provides high-quality 3D modeling and animation to deliver an immersive MR experience. Users can perform process procedures in front of equipment modeled to a 1:1 scale with actual semiconductor equipment and experience equipment operations through animations corresponding to each procedure.

Content Name
Actual Photo3D Modeling
Lithography Process

Etching Process

RF Sputter Process



  · Stable Frame Rate Maintenance through Performance Optimization  

To provide an immersive user experience, the optimization is tailored for mobile environments, ensuring a stable frame rate of at least 60 FPS. This is achieved by reducing polygon count in modeling, applying Level of Detail (LOD), minimizing texture resolution, and using baked lighting to apply lighting to textures, all contributing to performance optimization.


PC ModelingMobile Modeling (Applied to Semiconductor MR)
  



Content Structure

NOEight Major ProcessesContent TitleEquipmentContent DescriptionMR Implementation
1Wafer Manufacturing ProcessWafer Manufacturing Process
Edge GrinderLearning the wafer manufacturing process through quizzes.-
2Oxidation Proces----
3Photolithography ProcessExposure ProcessExposure EquipmentLearning the wafer exposure operation process by familiarizing with the photolithography exposure process and its procedures.-
Pattern Shape Measurement Equipment
Pattern Shape Measurement Device
Learning how to observe and inspect the wafer surface morphology using pattern shape measurement equipment.-
Lithography Process
Mask Aligner
Hot Plate
Spin Coater
Microscope
Learning the photolithography process procedures using a spin coater, hot plate, aligner, and microscope.
O
4Etching ProcessEtching ProcessPCMC
(Plasma Complex Machining Center)
Familiarizing with the operation methods of the plasma processing equipment and learning the coating process using cathode plasma and the etching process using anode plasma.
O
Dry Etcher
Shower Head Change
Dry EtcherLearning the maintenance process, including replacing the parts with a newly designed shower head after a gas failure causes uniformity issues in the PE-RIE equipment, and checking for any abnormalities in the equipment.-
5Deposition & Ion ProcessRF Sputter Process
RF Sputter
Learning the operating principle of RF sputtering and the process of thin film deposition through plasma.
O
Sputter System
Target Change & Chamber Cleaning
Plasma Sputtering
Learning the maintenance procedures for regular preventive maintenance (PM) of the Plasma Sputtering thin film deposition system, including metal target change and chamber cleaning.

Furnace System
Tube Change
SP CVD FurnaceLearning the maintenance procedures for regular PM of the Plasma Sputtering thin film deposition system, including metal target change and chamber cleaning.

6Metal Wiring Process
----
7EDS ProcessSemiconductor Tester
Semiconductor Tester
Learning the semiconductor inspection process using a semiconductor tester and the procedures for regular maintenance.
-
8Packaging Process----
9Cleaning ProcessPlasma Cleaning Equipment
Plasma Cleaning Equipment
Learning the operating principles and regular maintenance procedures for semiconductor cleaning process equipment using plasma.
-
10OthersCleanroom Usage and Response to Safety Incidents

Learning the procedures for wearing personal protective equipment (PPE), managing chemical safety, and the steps for disposal of used chemicals and reagents.
-



Technical Specifications

• Development Tools and Languages : Unreal Engine 5, C++  and Blueprint

•  Hardware Requirements 

Equipment Name
Meta Quest3Meta Quest Pro
Image



Recommended Content Specifications and Specs

 



(48732) 10th floor, 244, Jungang-daero, Dong-gu, Busan (Choryang-dong, Heungkuk Life Insurance Busan office building)

TEL : 1600-1663 

FAX : 051-977-0302 

 MAIL : info@samwooim.com 

Busan Headquarters : (48732) 10th floor, 244, Jungang-daero, Dong-gu, Busan (Choryang-dong, Heungkuk Life Insurance Busan office building)
Seoul IX Development Center : (04323) Room 812(Fast Five Seoul Station Branch), 366, Hangang-daero, Yongsan-gu, Seoul, Republic of Korea 

TEL : 1600-1663  |  FAX : 051-977-0302  |   MAIL : info@samwooim.com